Vistec Electron Beam GmbH

18/06/2026

New Press Release: Vistec Electron Beam GmbH will present its latest advancements at the 41st European Mask and Lithography Conference (EMLC 2026) in Jena, Germany, marking its 30th anniversary as a company built on 60 years of electron-beam innovation . The company's lithography systems utilize proprietary Variable Shaped Beam (VSB) technology to expose variable shapes rather than individual points, significantly reducing shot count and write time. When Cell Projection is integrated, this approach allows repeated geometries to be exposed in a single step, substantially boosting throughput for photonics, micro-optics, and AR/VR applications. Additionally, Vistec highlights its SB255 e-beam system, which seamlessly supports both direct-write and mask-making applications.

You’ll find more information here:

e-beam EBL VSB variable shaped beam direct mask write elektronenstrahllithographie electron beam lithography lithografie litografia

11/06/2026

We are really stoked that two of our collegues won the "Best Photon Micrograph" at the EIPBN 2026 Micrograph Contest sponsored by Zyvex Labs. Check it out here:

Conference Home / Conference / Micrograph Contest Micrograph Contest The 2026 Micrograph Contest is Now Closed. Thank you to all […]

31/03/2026

Vistec’s roots go back 60 years to Carl Zeiss in Jena, where engineers first adapted electron microscopy for microlithography. In 1996, the division became Leica Lithographie Systeme Jena, eventually transitioning to the Vistec name in 2005. Since 2012, it has operated as a subsidiary of DR. JOHANNES HEIDENHAIN GmbH.
Over decades, Vistec and its successors have shipped hundreds of Variable Shaped Beam (VSB) systems worldwide. Today, these tools combine VSB with Cell Projection technology, offering industry-leading flexibility and robustness. Vistec’s systems support diverse applications—from advanced research to low-volume manufacturing—and handle various substrates (100–300 mm wafers, 9” masks, and coupons).
Contact us to learn more. www.vistec-semi.com

02/03/2026

24/02/2026

Meet us at SPIE Advanded Lithography in San Jose February 24th and 25th.

SPIE Advanced Lithography + Patterning: The semiconductor conference for solving challenges in optical and EUV lithography, patterning technologies, metrology, and manufacturing.