14/04/2026
Did you know that the same type of plasma found in lightning bolts is also used in some of the most advanced materials science labs in the world?
In our latest Insights article, we explore how plasma-based deposition techniques, including PECVD and Plasma-Enhanced ALD, are helping researchers and engineers create thin film coatings with greater precision, uniformity, and performance than ever before.
We look at how these techniques work, the recent advances driving faster throughput and improved film quality, and what they mean for applications in semiconductors, optics, and photonics.
If you are working in thin film processing or advanced materials development, this is worth a read.
Please see the link below for the full article.
https://www.mi-net.co.uk/insight/glow-up-innovations-in-plasma-deposition-techniques-for-thin-film-processing/
The roots of plasma deposition stretch back to the early 20th century, when Nobel Prize-winning chemist Irving Langmuir coined the term “plasma” to describe the behaviour of ionised gases in electrical discharges. It wasn’t until the 1960s and 70s, however, that plasma began to be used in mate...