28/08/2026
KMPR® 1000 i-Line photoresist is a high-contrast, epoxy-based photoresist that can be developed in a conventional aqueous alkaline developer (TMAH) and is easier to remove after normal processing. Its excellent adhesion and chemical and plasma resistance make it ideal for various MEMS, electrolytic plating and DRIE applications.
A-Gas Electronic Materials offers this product, sourced from our supplier Kayaku Advanced Materials.
To learn more about the whole portfolio of products we can supply, please email [email protected] or visit our website https://www.agasem.com/