NGR Inc.® has been focusing on the development of a semiconductor verification tool based on a totally new concept since the foundation of the company in July 2000. is committed to innovation for semiconductor equipment to address the metrology and inspection needs of the 65nm and 45nm manufacturing nodes. Since its inception, NGR has focused its initial effort on the development of a die-to-database platform to address OPC and mask verification. This initial effort has yielded the introduction of the NGR®2100 2D metrology tool, which was introduced at the 2005 SPIE conference and received rave reviews for it's innovative approach to the industries core problems as we address the next generation manufacturing requirements. The next generation of NGR 2100 is NGR 3510. It's a SEM based platform that features a new industry standard for its large distortion free FOV, stitch and butt stage and image acquisition, and high speed/high accuracy 2D feature analysis. The tool is uniquely positioned to allow direct feedback into the EDA environment for OPC and model verification.
