01/28/2026
Where Do the Particles Go? (And Why That Question Matters More Than You Think)
In manufacturing environments, particles are everywhere — generated during cleaning, assembly, inspection, and handling. Yet one of the most overlooked questions in contamination control is also the most important:
Where do the particles actually go?
In many facilities, particles are blown off parts using compressed air or ionized air tools. But instead of being removed from the environment, those particles are simply displaced — settling elsewhere, recirculating in the air, or re-contaminating downstream processes.
At C. C. Steven & Associates, Inc., we don’t just ask that question — we have the solution.
The Hidden Problem with Traditional “Blow-Off” Systems
Most particle control systems fail for one simple reason:
They don’t provide enough face velocity to actually capture particulate.
Without sufficient airflow at the point of generation:
-Particles migrate instead of being removed
-Contamination spreads to nearby work areas
-Static charges attract particles back onto product surfaces
-Rework, defects, and yield loss increase
Many systems claim to capture particles, but without the correct airflow design, they simply move contamination from one place to another.
Introducing the Particle Capture System (PCS): Muon Trap® and Clean Family Products!
To solve this problem, C. C. Steven & Associates developed the Particle Capture System® Family of products, a U.S.-patented particle capture system designed specifically to capture particles at the source — not after they’ve already spread.
Why It Works:
Up to 4x greater face velocity than any other system in the field
True source capture, not redistribution
Closed-loop HEPA filtration
Optional ionization for static control
Designed for real-world manufacturing environments
This patented design allows particles to be captured immediately, preventing contamination from migrating through the workspace.
PCS System Configurations
The PCS Muon Trap® is available in multiple configurations to support a wide range of applications:
PCS Under Bench Mount®
PCS Clean Station®
PCS Clean Table®
PCS Clean Cube®
Vertical PCS Muon Trap®
Custom-engineered configurations
All systems are designed to integrate seamlessly into existing workflows while improving cleanliness, consistency, and process control.
Why Manufacturers Choose C. C. Steven & Associates
Since 1978, we’ve helped manufacturers solve complex challenges involving:
Particle contamination
Static electricity and ESD
Airflow and filtration
Process reliability
Yield improvement
What sets us apart isn’t sales — it’s providing solutions.
WE ARE THE EXPERTS! www.thestaticexperts.com
We combine:
U.S.-patented technology
Over 45 years of application experience
Hands-on customer education
Solutions built for real production environments
Visit Us at MD&M West 2026 (NEXT WEEK!)
📍 Anaheim Convention Center
📅 February 3–5, 2026
📌 Booth #2482
At our booth, you can:
See live demonstrations of all our Particle Capture System products (bring your parts to clean!)
Learn how face velocity impacts capture efficiency
Speak directly with our technical team
See why “blow-off” isn’t capture
Stop asking where the particles go — come see the solution.
https://youtu.be/zII9ITbMpSs
Bring your parts and come see a demo of how we can mitigate static fields to clean products and capture particulate with source capture! Our US patented/ US ...
