06/22/2026
A Chinese startup has claimed a major breakthrough in photonic chip manufacturing by producing 8-inch optical chip wafers without conventional deep ultraviolet (DUV) lithography. Hangzhou-based Prinano successfully validated mass production using nanoimprint lithography (NIL), a technology that physically stamps nanoscale patterns onto wafers instead of projecting them through optical systems.
Developed in collaboration with Shenzhen Litra Technology, this innovative process completely bypasses the need for restricted DUV tools. By utilizing vacuum air-cushion nanoimprint equipment, the company claims it can reduce manufacturing costs to about one-tenth of traditional solutions while offering sub-10-nanometer resolution.
The breakthrough comes as domestic chipmakers actively seek alternative manufacturing paths amid global equipment restrictions. While Prinano has not yet disclosed production yields or shipment data, the technology marks a significant step forward for silicon photonics, optical communication, and sensing devices.