05/12/2026
🔬NOVAIR is proud to sponsor the Advanced Semiconductor Manufacturing Conference (ASMC) 2026 at the Hilton in Albany, NY this week. ASMC is hosted by Semiconductor Equipment and Materials International (SEMI), bringing together leaders shaping the future of semiconductor manufacturing. NOVAIR USA Corp. CEO, John Longuil (J David Long) is in attendance.
⚡Nitrogen and oxygen are critical throughout the semiconductor manufacturing process. High-purity nitrogen is widely used for inerting, purging, wafer handling, and contamination prevention during sensitive production stages.
🔥Oxygen is essential for key semiconductor manufacturing processes including oxidation, photoresist stripping, select plasma applications, and waste gas abatement systems that help fabs maintain safe and compliant operations.
🏭 As semiconductor fabs continue demanding higher purity, reliability, and operational efficiency, on-site gas generation solutions are becoming increasingly valuable for ensuring continuous production while reducing dependence on delivered gas.
🌎 NOVAIR’s advanced oxygen and nitrogen generation technologies are engineered to provide dependable, high-purity gas solutions tailored for demanding industrial and semiconductor environments worldwide.
🤝 We look forward to connecting with industry professionals at ASMC 2026 and discussing how NOVAIR can support the next generation of semiconductor manufacturing.
More on NOVAIR Semiconductor solutions can be found here: https://www.novair-usa.com/applications/semiconductor-emissions-abatement/
More info on ASMC is here: https://www.semi.org/en/connect/events/advanced-semiconductor-manufacturing-conference-asmc