Angstrom Sciences, Inc.

Angstrom Sciences, Inc. Angstrom Sciences, Inc. designs, engineers and manufactures high-performance magnetron sputtering cathodes and PVD materials for all thin film applications.

Here is a pair of Ultra High Vacuum Linear cathodes with a target size of 50mm wide and 250mm in length. They use metal ...
09/01/2026

Here is a pair of Ultra High Vacuum Linear cathodes with a target size of 50mm wide and 250mm in length. They use metal seals and materials that have very low outgassing rates which will allow the vacuum base pressure to reach into the 10-10 torr range. This will eliminate water v***r and debris in the chamber for ultra-clean, thin film processing.

ONYX-3 IC Confocal with Heater Stage
08/25/2026

ONYX-3 IC Confocal with Heater Stage

Green plasma!Copper (Cu) is widely used material in thin film deposition for both its thermal and electrical properties....
08/17/2026

Green plasma!

Copper (Cu) is widely used material in thin film deposition for both its thermal and electrical properties. When sputtered using pure Argon (Ar) it gives off a brilliant green color.

Bonded Titanium Tungsten (TiW) Target Assembly
08/11/2026

Bonded Titanium Tungsten (TiW) Target Assembly

ONYX-1 and ONYX-3 magnetron sputtering cathodes with Flex Assembly and Water Cooled Anode.
08/03/2026

ONYX-1 and ONYX-3 magnetron sputtering cathodes with Flex Assembly and Water Cooled Anode.

This ONYX-512 rectangular cathode is being run using High Power Impulse Magnetron Sputtering or HIPIMS. This is a relati...
08/01/2026

This ONYX-512 rectangular cathode is being run using High Power Impulse Magnetron Sputtering or HIPIMS. This is a relatively recent advancement in sputtering technology used for the physical v***r deposition (PVD) of thin film coatings based upon magnetron sputtering with a high voltage pulsed power source. HIPIMS utilizes a very high voltage, short duration burst of energy focused on the target coating material to generate a high density plasma that results in a high degree of ionization of the coating material in the plasma. Some advantages are better adhesion, lower stress, very smooth/dense films, and good step coverage.

ONYX-10 Rotary Magnetron Sputtering Cathode. Rotary magnetrons are a type of circular magnetron where the magnet array i...
07/27/2026

ONYX-10 Rotary Magnetron Sputtering Cathode. Rotary magnetrons are a type of circular magnetron where the magnet array is mechanically rotated about a central axis behind the target. This ONYX-10 Rotary Magnetron Sputtering Cathode featured below was developed for a semiconductor application and allows for an extremely uniform coating of a stationary substrate while minimizing any particulate contamination.

ONYX-6535 Thick Copper Sputtering Target
07/21/2026

ONYX-6535 Thick Copper Sputtering Target

Here is an ONYX-4 Magnetron sputtering a 99.999% pure Aluminum (Al) target in an Argon (Ar) plasma.Did you know....Alumi...
07/13/2026

Here is an ONYX-4 Magnetron sputtering a 99.999% pure Aluminum (Al) target in an Argon (Ar) plasma.

Did you know....Aluminum was one of the first materials that was sputtered in the late 1800’s!

Here is a six cathode Magnetron Sputtering Confocal Array mounted on an ISO 500 fl**ge. The cathodes have flexible joint...
07/06/2026

Here is a six cathode Magnetron Sputtering Confocal Array mounted on an ISO 500 fl**ge. The cathodes have flexible joints, cross-contamination shields, and rotary shutters. This set-up is ideal for development work involving multiple layers of various materials. The cathodes run on both RF and DC and use a patented threaded clamping system that provides a quick and easy tool less target change.

Address

40 S Linden Street
Duquesne, PA
15110

Opening Hours

Monday 8am - 5pm
Tuesday 8am - 5pm
Wednesday 8am - 5pm
Thursday 8am - 5pm
Friday 8am - 5pm

Telephone

(412) 469-8466

Website

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